Filson CVD Reactor

  • High reaction efficiency for high production
  • Innovative solution for inorganic synthetic chemistry
  • Robust construction to withstand high pressure and harsh environments
  • Stable performance for maximum operation safety
  • Enhanced versatility serving various industrial applications

Filson CVD reactor refers to chemical vapor deposition reactor, it is a chemical reactor that uses one or more gas-phase compounds or monomers containing thin film elements to produce thin films on the surface of a substrate.

  • Construction material: stainless steel, Hastelloy, Titanium, Monel
  • Working temperature: 300 – 500℃
  • Reactor volume: 1000 – 2000L
  • Heating power: 300 – 500W
  • Operation style: batch, semi-batch, continuous
  • Minimum order quantity: 1pcs

Note: specific material, volume and operation vary from one application to another, more details to be known by consulting Filson experienced engineers.

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Filson CVD Reactor

Your Professional CVD Reactor Manufacturer in China

Chemical vapor deposition is a new technique for the preparation of inorganic materials developed in recent decades. And as one of the most vital equipments in the whole process, Filson CVD reactor gets more and more popular in the market.

Filson chemical vapor deposition reactor has been widely used to purify substances, develop new crystals and precipitate various single-crystal, polycrystalline or glassy inorganic thin film materials.

Since Filson CVD reactor is a new-style and high-end chemical reactor, it is mostly applied to semiconductor industry for wafer production. Besides, the reactor is served as surface coating device in various applications.

To know more information about CVD reactor, please contact Filson today. And for other types of chemical reactors, such as polymerization reactor and membrane reactor, you can also find at Filson.

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